杨占山,朱寿彭,杨淑琴.低剂量不同辐射体核素内污染对DNA损伤修复的影响[J].中华放射医学与防护杂志,2000,20(6):395-397.YANG Zhanshan,ZHU Shoupeng,YANG Shuqin.Effects of in vivo exposure to low doses of different radiator nuclides on DNA repair capability[J].Chin J Radiol Med Prot,2000,20(6):395-397
低剂量不同辐射体核素内污染对DNA损伤修复的影响
Effects of in vivo exposure to low doses of different radiator nuclides on DNA repair capability
投稿时间:2000-04-17  
DOI:
中文关键词:  235U2F2  147Pm  淋巴细胞  生殖细胞  非程序DNA合成
英文关键词:235UO2F2  147Pm  Lymphocytes  Germ cells  UDS
基金项目:国家核工业科学基金资助项目(71966201)
作者单位
杨占山 215007 江苏, 苏州大学核医学院 
朱寿彭 215007 江苏, 苏州大学核医学院 
杨淑琴 215007 江苏, 苏州大学核医学院 
摘要点击次数: 3265
全文下载次数: 2109
中文摘要:
      目的 研究低剂量不同辐射体核素内污染对细胞DNA损伤修复的作用及其机理。方法 应用紫外线诱导的非程序DNA合成检测,观察了不同剂量水平浓缩铀(235U2F2)和钷147(147Pm)内污染对小鼠脾淋巴细胞和精子细胞DNA切除修复的影响。结果 浓缩铀摄入量为01~20μg/kg体重时,脾淋巴细胞紫外线诱导的非程序DNA合成显着高于正常对照组(P<0.05,或0.01);浓缩铀内污染机体12d后,脾淋巴细胞末经紫外线照射的非程序DNA合成显着增加(P<0.05或0.01);PHA组脾淋巴细胞紫外线诱导的非程序DNA合成显着低于未加PHA组(P<0.05或0.01),147Pm内污染放射性活度为37~185Bq/g体重时,脾淋巴细胞和精子细胞紫外线诱导的非程序DNA合成显着增高(P<0.05或0.01);当147Pm增至3700Bq/g体重时,脾淋巴细胞和精子细胞紫外线诱导的非程序DNA合成显着减低(P<0.05或0.01).结论 在一定剂量范围内,低剂量浓缩铀和147Pm内污染对体细胞和生殖细胞DNA切除修复功能具有明显的刺激作用,而高剂量浓缩铀和147Pm内污染可使细胞DNA切除修复功能明显抑制;浓缩铀内污染对淋巴细胞DNA具有持续的损伤作用,继而诱发淋巴细胞DNA修复功能的增强;PHA刺激但未增殖的脾淋巴细胞DNA切除修复功能明显减低。
英文摘要:
      Objective To elucidate the effects and mechanism of in vivo exposure to low doses of different radiator nuclides on DNA repair capability. Methods The DNA excision repair capacity, as measured by UV-induced unscheduled DNA synthesis (UDS), of splenic lymphocytes and germ cells from inbred BALB/c male mice was observed after injection of different dose of 235UO2F2 or 147Pm(NO3)3 into tailvein. Results UV-induced UDS of the splenic lymphocytes was significantly increased (P<0.05 or 0.01) when the mice were exposed to 235UO2F2 at doses of 0.1-20 μg/kg body weight or 147Pm at doses of 37~185 Bq/g body weight, and UV-induced UDS of the germ cells was also increased at above doses of 147Pm (P<0.05 or 0.01).While the UV-induced UDS of these cells was decreased at doses of 3 700 kBq/g body weight of 147Pm (P<0.05 or 0.01).Non-UV-induced UDS showed a significant increase on the 12th day after 235UO2F2 injection(P<0.05 or 0.01).The values of UV-induced UDS in PHA activated but non-proliferating (hydroxyurea treated) lymphocytes were lower than those of lymphocytes unexposed to PHA at the same doses of 235UO2F2(P<0.05 or 0.01). Conclusion Low doses of internally deposited 235UO2F2 and 147Pm have a continuous damage effect on DNA of the murine somatic and germ cells so that a significant stimulative effect on DNA excision repair of the cells is induced.But higher doses of 147Pm irradiation have a significant inhibitory effect on DNA repair of those cells.The stimulative effect occurs only in a limited range of dose.In PHA stimulated but non-proliferating lymphocytes, the DNA repair synthesis is significantly inhibited after UV-irradiation.
HTML  查看全文  查看/发表评论  下载PDF阅读器
关闭